Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.Documents
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CATEGORY
Coaters & Developers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131695
Wafer Sizes:
8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
LITHIUS Pro Z
CATEGORY
Coaters & Developers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131695
Wafer Sizes:
8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.Documents
No documents