Description

Magna 200 Cluster PVD Scia Systems GmbH's (Supplier) off-axis AlN PVD Cluster tool “scia Cluster 200” is a sputter deposition tool consisting of a Brooks handler, one pre-clean chamber with ICP source, one PVD chamber capable of depositing Seed aluminum nitride, and one PVD chamber capable of depositing Bulk aluminum nitride on 200mm substrates. The Equipment is designed for deposition of off-axis AlN and bulk AlN films. Wafers are transported via the Brooks handler through the system. Film deposition in the PVD seed chamber is done by reactive magnetron sputtering under a certain angle. The angular distribution of the system is narrowed by using a collimator system. The manually adjustable target to substrate distance and angle allows process optimization.

Configuration

· Automated cluster platform with Brooks Automation MX700 with cassette loading, vacuum pre-aligner, wafer-ID reader and cooling station · Wafer Pre-Clean Chamber with ICP source and mechanical wafer stage · Off-Axis AlN Seed Deposition Chamber o Additional E-chuck with cooling / heating 0…80°C o Additional E-chuck with heating up to 200 °C · SECS II/GEM Interface · RGA Integration · Facility supply including gas channels, compressed air and cooling water distribution · Control rack with electrical power supply and control PC · Including installation and training ⦁ Flow meter monitoring upgrade for additional IO-Link-Master to monitor cooling water flow meters in tool operation software.