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KLA 8100XPR
  • KLA 8100XPR
  • KLA 8100XPR
  • KLA 8100XPR
  • KLA 8100XPR
Description
No description
Configuration
Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • 1 or 2 Reticle loading stations, 1 or 2 wafer cassette loading stations • Reticle size: 5" or 6" square • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 1 or 2 wafer loading stations (each can run multiple sizes) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZ
OEM Model Description
None Provided
Documents

No documents

verified-listing-icon

Verified

CATEGORY
CD-SEM

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

117151


Wafer Sizes:

Unknown


Vintage:

1999


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

8100XPR

verified-listing-icon
Verified
CATEGORY
CD-SEM
Last Verified: Over 60 days ago
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/f2260899b822425c9a6163a2e8fe5aa7_686d7f194ed44493a92158e22571c89e1201a_mw.jpeg
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/7d3c16d75e6447459a9902cb4524ff88_15183797c5a549ffb9ee672fed5d30601201a_mw.jpeg
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/e4c5cb5a01f24d1da2d676438b9f3940_aec5c1be02ef4c698ed0b295acb2487b_mw.png
listing-photo-d8ff0164b11a4bc886faecdfc10abc53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1370/d8ff0164b11a4bc886faecdfc10abc53/020d06e8769446a7b874bce829955102_040c9f8447814194bd5978a764d9cee1_mw.png
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

117151


Wafer Sizes:

Unknown


Vintage:

1999


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • 1 or 2 Reticle loading stations, 1 or 2 wafer cassette loading stations • Reticle size: 5" or 6" square • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 1 or 2 wafer loading stations (each can run multiple sizes) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZ
OEM Model Description
None Provided
Documents

No documents