Description
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Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEM Model Description
The KLA-Tencor 8100XP CD SEM is a state-of-the-art scanning electron microscope used in semiconductor manufacturing. It enables precise and fast measurements of critical dimensions (CD) in small device geometries. The CD SEM has advanced capabilities for imaging and measuring high aspect ratio features, ensuring optimum device performance. It offers productivity-enhancing features such as high throughput, networking, offline recipe setup, and full system automation.Documents
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KLA
8100XP
Verified
CATEGORY
CD-SEM
Last Verified: 5 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
117150
Wafer Sizes:
Unknown
Vintage:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllKLA
8100XP
CATEGORY
CD-SEM
Last Verified: 5 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
117150
Wafer Sizes:
Unknown
Vintage:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEM Model Description
The KLA-Tencor 8100XP CD SEM is a state-of-the-art scanning electron microscope used in semiconductor manufacturing. It enables precise and fast measurements of critical dimensions (CD) in small device geometries. The CD SEM has advanced capabilities for imaging and measuring high aspect ratio features, ensuring optimum device performance. It offers productivity-enhancing features such as high throughput, networking, offline recipe setup, and full system automation.Documents
No documents