Description
No descriptionConfiguration
Performance Specification: • Feature Size: < 100 nm • Resolution: < 4.5 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 40 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEM Model Description
KLA, a leading company in the field of metrology, has invested heavily in engineering and manufacturing to develop its next-generation tool, the KLA 8100. This advanced E-Beam metrology system builds on the success of KLA’s first-generation tool, which boasted high throughput and an automated setup process. The KLA 8100 promises to be even more advanced, making it an attractive option for manufacturers.Documents
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KLA
8100
Verified
CATEGORY
CD-SEM
Last Verified: 5 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
117149
Wafer Sizes:
Unknown
Vintage:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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KLA
8100
CATEGORY
CD-SEM
Last Verified: 5 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
117149
Wafer Sizes:
Unknown
Vintage:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Performance Specification: • Feature Size: < 100 nm • Resolution: < 4.5 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 40 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEM Model Description
KLA, a leading company in the field of metrology, has invested heavily in engineering and manufacturing to develop its next-generation tool, the KLA 8100. This advanced E-Beam metrology system builds on the success of KLA’s first-generation tool, which boasted high throughput and an automated setup process. The KLA 8100 promises to be even more advanced, making it an attractive option for manufacturers.Documents
No documents