Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The eCD 1— unveiled in February 2003—features the precision and resolution to meet the CD metrology performance requirements for the 90-nm technology node and beyond. The eCD 1 is based on a new platform, and all its design aspects have been precision suited for 90-nm node metrology requirements, and extendible to the 65-nm node. eCD 1 is well suited for applications involving 193-nm lithography and very-high-aspect-ratio structures.Documents
No documents
KLA
eCD-1
CATEGORY
CD-SEM
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
126101
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The eCD 1— unveiled in February 2003—features the precision and resolution to meet the CD metrology performance requirements for the 90-nm technology node and beyond. The eCD 1 is based on a new platform, and all its design aspects have been precision suited for 90-nm node metrology requirements, and extendible to the 65-nm node. eCD 1 is well suited for applications involving 193-nm lithography and very-high-aspect-ratio structures.Documents
No documents