Description
CDSEMConfiguration
No ConfigurationOEM Model Description
Hitachi High-Technologies Corporation has launched DESIGNGAUGE, a mask design data measuring system aimed at improving efficiency and production yield in semiconductor device design and development. DESIGNGAUGE accurately collates and compares mask pattern design data with circuit pattern image data on the wafer, obtained through a critical dimension scanning electron microscope (CD-SEM). It enables the creation of measurement recipes offline that were previously only possible with a CD-SEM, allowing remote control of the CD-SEM to automatically align mask pattern design data with the wafer's test pattern. This significantly streamlines the data acquisition process for creating an optical proximity correction (OPC) model, reducing the time required compared to conventional techniques. Hitachi High-Tech is committed to further enhancing the accuracy and capabilities of DESIGNGAUGE and developing DFM-based measuring technologies to meet evolving metrology needs.Documents
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HITACHI
S-9380 II
CATEGORY
CD-SEM
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
132757
Wafer Sizes:
12"/300mm
Vintage:
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
CDSEMConfiguration
No ConfigurationOEM Model Description
Hitachi High-Technologies Corporation has launched DESIGNGAUGE, a mask design data measuring system aimed at improving efficiency and production yield in semiconductor device design and development. DESIGNGAUGE accurately collates and compares mask pattern design data with circuit pattern image data on the wafer, obtained through a critical dimension scanning electron microscope (CD-SEM). It enables the creation of measurement recipes offline that were previously only possible with a CD-SEM, allowing remote control of the CD-SEM to automatically align mask pattern design data with the wafer's test pattern. This significantly streamlines the data acquisition process for creating an optical proximity correction (OPC) model, reducing the time required compared to conventional techniques. Hitachi High-Tech is committed to further enhancing the accuracy and capabilities of DESIGNGAUGE and developing DFM-based measuring technologies to meet evolving metrology needs.Documents
No documents