Description
300mm depending on model Resolution: 1.8nm R&D to mass production High throughput (Faster: 36~50 wafers/h) Refurbished equipment Overhaul customer's inventory On site trouble shooting Periodic maintenance, tip replacement Fab to fab or inside fab relocations Wafer modificationConfiguration
No ConfigurationOEM Model Description
The CG4100 is a high-throughput instrument for 32-nm process production and 22-nm process development which was designed to meet the measurement needs of the latest generation of double patterning techniques.Documents
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HITACHI
CG4100
CATEGORY
CD-SEM
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131697
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
300mm depending on model Resolution: 1.8nm R&D to mass production High throughput (Faster: 36~50 wafers/h) Refurbished equipment Overhaul customer's inventory On site trouble shooting Periodic maintenance, tip replacement Fab to fab or inside fab relocations Wafer modificationConfiguration
No ConfigurationOEM Model Description
The CG4100 is a high-throughput instrument for 32-nm process production and 22-nm process development which was designed to meet the measurement needs of the latest generation of double patterning techniques.Documents
No documents