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APPLIED MATERIALS (AMAT) VeritySEM 2
    Description
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    Configuration
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    OEM Model Description
    The Applied VeritySEM 2 Metrology system offers unparalleled precision and maximum production throughput, measuring 45nm gate, low-k, and ArF resist features with 3Å accuracy, essential for 45nm device production. Enhanced by its advanced automation, this system drastically reduces the need for tool operators and cuts down on CD-SEM tools in fabs. A standout feature, the OPC Check, automates the Optical Proximity Correction mask qualification, catering to evolving chipmaker needs. Proprietary SEM technology ensures speedy electron movement and precise measurements, resulting in top-notch resolution.
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    APPLIED MATERIALS (AMAT)

    VeritySEM 2

    verified-listing-icon

    Verified

    CATEGORY

    CD-SEM
    Last Verified: Over 60 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    44388


    Wafer Sizes:

    Unknown


    Vintage:

    2007

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    Transaction Insured by Moov
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    APPLIED MATERIALS (AMAT) VeritySEM 2
    APPLIED MATERIALS (AMAT)VeritySEM 2CD-SEM
    Vintage: 0Condition: Used
    Last VerifiedOver 30 days ago

    APPLIED MATERIALS (AMAT)

    VeritySEM 2

    verified-listing-icon

    Verified

    CATEGORY

    CD-SEM
    Last Verified: Over 60 days ago
    listing-photo-1d232ec2e1834d10a0c6e8850e2f838d-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    44388


    Wafer Sizes:

    Unknown


    Vintage:

    2007


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The Applied VeritySEM 2 Metrology system offers unparalleled precision and maximum production throughput, measuring 45nm gate, low-k, and ArF resist features with 3Å accuracy, essential for 45nm device production. Enhanced by its advanced automation, this system drastically reduces the need for tool operators and cuts down on CD-SEM tools in fabs. A standout feature, the OPC Check, automates the Optical Proximity Correction mask qualification, catering to evolving chipmaker needs. Proprietary SEM technology ensures speedy electron movement and precise measurements, resulting in top-notch resolution.
    Documents

    No documents

    Similar Listings
    View All
    APPLIED MATERIALS (AMAT) VeritySEM 2
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    VeritySEM 2
    CD-SEMVintage: 0Condition: UsedLast Verified: Over 30 days ago
    APPLIED MATERIALS (AMAT) VeritySEM 2
    APPLIED MATERIALS (AMAT)
    VeritySEM 2
    CD-SEMVintage: 2007Condition: UsedLast Verified: Over 60 days ago
    APPLIED MATERIALS (AMAT) VeritySEM 2
    APPLIED MATERIALS (AMAT)
    VeritySEM 2
    CD-SEMVintage: 2007Condition: UsedLast Verified: Over 60 days ago