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LAM RESEARCH / NOVELLUS / GASONICS PEP 3510plus
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The PEP 3510Plus is a sophisticated system designed for the damage-free removal of photoresist. It is a dual chamber microwave downstream photoresist removal system that uses a combination of platen and lamp wafer heating to achieve high strip rates, resulting in high throughput. This production-proven system is commonly used for bulk photoresist removal and descum applications. Its advanced technology ensures efficient and effective photoresist removal.
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    verified-listing-icon

    Verified

    CATEGORY
    Ashers / Plasma Cleaner

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    132012


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    LAM RESEARCH / NOVELLUS / GASONICS PEP 3510plus

    LAM RESEARCH / NOVELLUS / GASONICS

    PEP 3510plus

    Ashers / Plasma Cleaner
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    LAM RESEARCH / NOVELLUS / GASONICS

    PEP 3510plus

    verified-listing-icon
    Verified
    CATEGORY
    Ashers / Plasma Cleaner
    Last Verified: Over 60 days ago
    listing-photo-fcfde655ae494ed1af4235fe196e7b61-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    132012


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The PEP 3510Plus is a sophisticated system designed for the damage-free removal of photoresist. It is a dual chamber microwave downstream photoresist removal system that uses a combination of platen and lamp wafer heating to achieve high strip rates, resulting in high throughput. This production-proven system is commonly used for bulk photoresist removal and descum applications. Its advanced technology ensures efficient and effective photoresist removal.
    Documents

    No documents

    Similar Listings
    View All
    LAM RESEARCH / NOVELLUS / GASONICS PEP 3510plus

    LAM RESEARCH / NOVELLUS / GASONICS

    PEP 3510plus

    Ashers / Plasma CleanerVintage: 0Condition: UsedLast Verified:Over 60 days ago
    LAM RESEARCH / NOVELLUS / GASONICS PEP 3510plus

    LAM RESEARCH / NOVELLUS / GASONICS

    PEP 3510plus

    Ashers / Plasma CleanerVintage: 0Condition: UsedLast Verified:Over 60 days ago
    LAM RESEARCH / NOVELLUS / GASONICS PEP 3510plus

    LAM RESEARCH / NOVELLUS / GASONICS

    PEP 3510plus

    Ashers / Plasma CleanerVintage: 0Condition: UsedLast Verified:Over 60 days ago