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LAM RESEARCH / NOVELLUS / GASONICS PEP 3510plus

Description

No description

Configuration

No Configuration

OEM Model Description

The PEP 3510Plus is a sophisticated system designed for the damage-free removal of photoresist. It is a dual chamber microwave downstream photoresist removal system that uses a combination of platen and lamp wafer heating to achieve high strip rates, resulting in high throughput. This production-proven system is commonly used for bulk photoresist removal and descum applications. Its advanced technology ensures efficient and effective photoresist removal.

Documents

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LAM RESEARCH / NOVELLUS / GASONICS

PEP 3510plus

Verified

CATEGORY

Ashers / Plasma Cleaner

Last Verified: Yesterday

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

125465

Wafer Sizes:

Unknown

Vintage:

Unknown

Have Additional Questions?

Logistics Support

Available

Money Back Guarantee

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

Similar Listings

LAM RESEARCH / NOVELLUS / GASONICS PEP 3510plus

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LAM RESEARCH / NOVELLUS / GASONICS PEP 3510plus

LAM RESEARCH / NOVELLUS / GASONICS

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Ashers / Plasma Cleaner

Vintage: 0Condition: Used

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LAM RESEARCH / NOVELLUS / GASONICS

PEP 3510plus

verified-listing-icon

Verified

CATEGORY

Ashers / Plasma Cleaner

Last Verified: Yesterday

listing-photo-ab7b88d8a6184b118b5681bd03a7fb8f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/77732/ab7b88d8a6184b118b5681bd03a7fb8f/d911fb0940da4a0ba1a251922fbf0aba_gasonics3_mw.jpg

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Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

125465

Wafer Sizes:

Unknown

Vintage:

Unknown

Have Additional Questions?

Logistics Support

Available

Money Back Guarantee

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

Description

No description

Configuration

No Configuration

OEM Model Description

The PEP 3510Plus is a sophisticated system designed for the damage-free removal of photoresist. It is a dual chamber microwave downstream photoresist removal system that uses a combination of platen and lamp wafer heating to achieve high strip rates, resulting in high throughput. This production-proven system is commonly used for bulk photoresist removal and descum applications. Its advanced technology ensures efficient and effective photoresist removal.

Documents

No documents

Similar Listings

LAM RESEARCH / NOVELLUS / GASONICS PEP 3510plus

LAM RESEARCH / NOVELLUS / GASONICS

PEP 3510plus

Ashers / Plasma CleanerVintage: 0Condition: UsedLast Verified:Yesterday

LAM RESEARCH / NOVELLUS / GASONICS PEP 3510plus

LAM RESEARCH / NOVELLUS / GASONICS

PEP 3510plus

Ashers / Plasma CleanerVintage: 0Condition: UsedLast Verified:Over 30 days ago