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LAM RESEARCH / NOVELLUS / GASONICS PEP IRIDIA
  • LAM RESEARCH / NOVELLUS / GASONICS PEP IRIDIA
  • LAM RESEARCH / NOVELLUS / GASONICS PEP IRIDIA
  • LAM RESEARCH / NOVELLUS / GASONICS PEP IRIDIA
Description
No description
Configuration
Bulk list of parts for Novellus PEP IRIDIA LIST ATTACHED
OEM Model Description
The PEP IRIDIA is an advanced cleaning system designed for sub-0.18-micron 200mm wafer applications. The IRIDIA’s modular architecture allows manufacturers to configure the system for both front and back-end-of-line cleaning applications down to 90 nanometer device geometries. Targeted at critical steps in copper and low-k manufacturing processes, the IRIDIA offers the highest productivity of any 200mm dry-clean system currently on the market.
Documents
CATEGORY
Ashers / Plasma Cleaner

Last Verified: Over 60 days ago

Key Item Details

Condition:

Parts Tool


Operational Status:

Unknown


Product ID:

82646


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / NOVELLUS / GASONICS

PEP IRIDIA

verified-listing-icon
Verified
CATEGORY
Ashers / Plasma Cleaner
Last Verified: Over 60 days ago
listing-photo-35580047d3ab49c29b60fe07dc862e6f-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Key Item Details

Condition:

Parts Tool


Operational Status:

Unknown


Product ID:

82646


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
Bulk list of parts for Novellus PEP IRIDIA LIST ATTACHED
OEM Model Description
The PEP IRIDIA is an advanced cleaning system designed for sub-0.18-micron 200mm wafer applications. The IRIDIA’s modular architecture allows manufacturers to configure the system for both front and back-end-of-line cleaning applications down to 90 nanometer device geometries. Targeted at critical steps in copper and low-k manufacturing processes, the IRIDIA offers the highest productivity of any 200mm dry-clean system currently on the market.
Documents