Description

BRANSON L3200 PHOTORESIST STRIPPER PLASMA ASHER Reactor Center * One quartz chamber for 200 mm wafers, cassette to cassette operation * Automatic pneumatic soft-lift assemblies for each chamber * In-line gas filters * Quartz halogen lamp for preheating * Process capabilities: positive and negative resist, hardened resist, polyimide AW Software and controller Allwin21 Corp. provided AW Control Software and Superior Temperature Control Technology to upgrade the IPC L3200 which provides the following significant advantages. New hardware includes: New control Board with cable, new timer counter with watch dog, Pentium Computer with 17” LCD Monitor, standard keyboard and mouse. Software calibration and easy to be done. More functions and I/O hardware “exposed” for easier maintenance and trouble shooting. It is easy to edit recipe with GUI and graph display. Save all process data on the computer hard disk. A/D and D/A precision is 14 to 16 bits. Detect in process and with color curve displayed on the screen. Robot teach is on the GUI and easy to do the procedure with new concept teaching method. Software watch dog to eliminate machine damage duo to the computer locks up or freeze. Sensor status detect function. On line help function Have the capacity for long time recipe Gas Handling Module and Control Features * Two process gas lines and one purge line to include: One O2 mass flow controller, Optional gas (blank), fast and slow N2 purge * All Stainless steel valves and gas lines * Automatic variable throttle valve for pressure control * Capacitance manometers for chamber with isolation valve Wafer Handling and Sensing * Automatic pick-and-place wafer handling * Elevator cassette stands for send-to-receive operation DC Power Module * Distributes AC/DC power to system System Power Control Panel * AC ON/OFF for system power, RF generator, and vacuum pumps Power Cabinet Assembly * 510 Power Distribution Module * Wafer Heating Module * System control for system power, RF generator, and vacuum pumps control signal * Shielded high-voltage components * Emergency OFF switches * Cover safety interlocks * 12-VAC control to complete system * ENI Mod.-12A RF Generator, 13.56MHz, crystal controlled, 0-1000 watts, continuously rated, Solid state, water-cooled Safety and Security Features * All covers interlocked * Emergency OFF switches * Electronic and software interlocks for RF power, wafer heating and gas flow Facility Requirements * Compressed air: 60 to 120 psig (clean and dry) * System Electrical power: 200 to 240VAC, 40 amp, 1 phase, 50/60 Hz * Wafer Heating power: 200 to 240VAC, 15 amp, 1 phase, 50/60 Hz * Cooling water: 1.2 gal/min (house water, filtered) for RF generator * House vacuum: at leastg .8CFM @ 20 inches Hg * Mainframe air exhaust: 4 inch duct flange, 100 CFM

Configuration

One chamber with one Equipe PRI ATM-104-1 robot and ESC-200 controller; 2 gas lines with MFCs: O2 a 5 L MFC for gas 1 and a 500 mL CF4 MFC for gas 2 System is for 8 inch round wafer; System can run long time recipe(4 hours); new type DC power box and AC power box; Upgraded with Allwin21 Corp proprietary AW-3210 AW software package with PC control and New Main Control Board. V.7.E42 Black Waffer Disc Tray DB25 Serial RS232 End Effector Dimensions: 7.75″x1.25″ (LxW) N2 Purge Air Gauge: Dwyer RMA-5-99V Eurotherm 808 Temperature Controller MKS BARATRON SENSOR 10 TORR, MKS 622A11TDE Type: 622