The Santa Clara Plastics / SCP Evolution 200 (E200) is an oxide etch wet station used in the semiconductor industry. The E200® offers both traditional and innovative solutions to wet surface preparation. The E200® is GreenDry CI™ (Chemical Inject) capable of HF, HCl, or ozone inject for cleaning and silicon surface preparation with integrated rinse/dry. It has hydrophilic particle results of particle neutral @ 120nm and 90nm and hydrophobic particle results of < 5 particle adders @ 120nm and < 20 particle adders @ 90nm. The E200® is the industry’s first truly modular construction with individual stainless steel frame and rotomolded plenum for a leak-proof design. It is made of fire-safe materials and has slide mount components for manufacturability and serviceability.

SANTA CLARA PLASTICS / SCP

EVOLUTION 200 (E200)

9400

Manual wet bench for wafer cleaning and wet chemical processing.

Wet Bench

9415

8500

SEMI AUTO

9200

2700

ECLIPSE S300

SANTA CLARA PLASTICS / SCP

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EVOLUTION 200 (E200)

9400

Wet Bench

9415

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