NANO-MASTER,INC

NRP-4000

Sputtering system, 26” Width 26” Depth 44” Height

NSC-3000

NANO-MASTERS’s Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with IR heating and N2 flow. Patented megasonic nozzle movement assures uniform delivery of megasonic energy; therefore, at any point on the surface, energy delivered can be kept below damage threshold.

NANO-MASTER,INC

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NRP-4000

NSC-3000

SWC-4000

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