GHW-12

Welcome to the future of mass spectrometer-based helium leak detection. Weighing 17 lbs., the PICO is truly the smallest mass spectrometer-based leak detector available in the world today. Incorporating advanced technology in mass spectrometry and vacuum technology (patents pending), the PICO provides fast, contamination-free, leak detection. As a vacuum style helium leak detector, the PICO can be quickly and easily transported to the vacuum system to be leak tested without the need for bulky transport carts. In addition to an ion trap mass spectrometer, the PICO has an integral vacuum system which incorporates a turbomolecular pump as well as a backing scroll pump. Aided by the small volumes of the unit, the PICO has a very fast response and clean-up time. The PICO incorporates a removable handheld remote display with 15 ft. of interconnecting cable. The user interface is self-intuitive and very simple to use. The helium leak rate is displayed in numeric, bar graph, and historical trending formats. The remote display also incorporates an audio alarm which can be heard in very noisy environments, often encountered in leak detection applications. The PICO also includes self-protection circuitry that protects the integral turbomolecular pump from situations which would normally damage the turbo pump and require significant repair. The unit also includes a "zero" feature that compensates for background levels of helium often encountered in leak detection applications.

PICO

AX8575

The NOVA®-25A 2.5 kW, 2 MHz RF Plasma Generator offers advanced RF plasma generation and control for low cost and high yield in the most demanding thin film processing applications. NOVA RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.

NOVA-25A

EDGE 2502A

ACG-6B-01

1179A

MWC-01

1480A

Water Delivery System 
12-49 ppm, 60 lpm, Modular

LIQUOZON HeliO3

LIQUOZON VariO3

626C.01

127AA-00002B

AX8403A

SEMOZON AX8560

AX8555

647B4R0TE

Plasma Clean System: clears out buildup, byproducts, and deposits from CVD (chemical vapor deposition) and etch pumping lines right where they happen

CleanLine Foreline 

MWJ-1213

GEODE

AX8561RH

AX7710MKS

Cleanline ISO80

The GHW12 13.56 MHz, 1.25 kW, RF Plasma Generator is ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications. GHW Series RF Plasma Generators are available at 208 VAC and 400/480 VAC. GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices. All MKS Instruments' RF Generators are NRTL certified and CE marked.

GHW-50

D103

EDGE30R40A

247C

PAS 

Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination.

R*evolution

PDR-C-1C	

FS-100

ASTEX AX 8500

T3BIA-28104

VODMC33CR1BE

TMP-H3153LMC

OEM-25XL	

SRG3-EL

626A21TDE

DSS CW2 V2	

CIRRUS2

EDGE6513A

OEM-12B-06	

AX8559

Integrated remote plasma source AX7695 - on wafer processing, higher flow rates, lowest cost “clean” source of atomic radicals.

R*evolution III

B-5002-12054	

LIQUOZONE PRIMO3

AX7690PSK-04

PVS-6

The MKS Type 649 is a single instrument that provides both pressure control and flow metering. The Type 649 replaces multiple component subassemblies, for example pressure controllers with separate flow meters used in applications such as backside wafer cooling systems (BWCS). The compact Type 649 design allows for significant reduction in BWCS size and complexity.

649A

OEM-25A	

647B4RLTE

AX8403

The NOVA®-50A 5.0 kW 2 MHz RF Plasma Generator is ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications. NOVA RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.

NOVA-50A

EDGE 1513A

EDGE 1527A

253B-16083

Smart ozonated water delivery system is a self-contained unit that provides DIO3 water (ultra pure ozonated water) with exceptionally high, accurate and stable ozone concentration utilizing constant pressure. The basic LIQUOZON Smart configuration is for flows up to 25 liters per minute, the High Flow option is able to handle flow up to 50 liters per minute – for multiple outlets, flow rates up to 80 liters per minute are available. Maximum dissolved ozone concentration is 80ppm.

LIQUOZON

DCG-200Z	

***PARTS***

OEM-650A	

EDGE 210R40A-G12

EDGE 6060A-G12

FI20162-1	

AX7657-2	

DCS80-13E

AX3063	

The AX8407 SEMOZON® is a high concentration, ultra-clean ozone generator. Through design enhancements, SEMOZON® AX8407 extends the capability of patented MKS cell technology and production-proven design providing the highest performance for its size. AX8407 is the highest purity ozone generator on the market. It converts pure oxygen into ozone through silent electrical discharge and achieves the highest output concentration levels available. It requires only minute levels of dopant nitrogen gas, far below the levels required for competitive ozone generators. As a result, the ozone is ultra-clean and the presence of contaminants, e.g. NOx compounds, is extremely low. Ozone is an environmentally friendly alternative to many chemical processes. It has a high redox potential, can be generated at the point of use and is easily converted back to oxygen. Typical semiconductor ozone applications include TEOS/Ozone CVD, Ta2O5 CVD, photoresist strip, wafer cleaning, contaminant removal, surface conditioning, oxide growth, and ALD. Ozone is also ideally suited for use in pharmaceutical and water processing applications including cleaning, sterilization and disinfection, as well as Clean-In-Place (CIP).



AX8407

D13449	

649A21T11CAFR-S

GEW-3540	

GHW-85A	

ASTRONex	

GHW-50Z	

FI20612

GHW-12Z	

1179A14CR1BV

NW 100

150R40A-D01

113BJ1-P

OEM-25	

OEM-6AM-1B	

AX7700-11

MWH-100-01M6

OEM-12	

AX3151	

FI20608

AX3060-1	

OEM-25G

FI20160-1	

AX9004	

647B

PR 4000

Remote Plasma Source for On-Wafer Processing

AX7690

AX7650	

PC-3G

FI20609	

AX3063ULVJ	

GL-139	

The GHW25 13.56 MHz, 2.5 kW, RF Plasma Generator is available with Auto-Frequency Tuning for fixed matching networks, resulting in faster tuning and lower system cost. GHW Series RF Plasma Generators are available at 208 VAC and 400/480 VAC. GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices. All MKS Instruments' RF Generators are NRTL certified and CE marked.

GHW-25

626D11TDE

MKS

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