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CANON FPA-6000ES5
    Description
    No description
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    OEM Model Description
    The Canon FPA-6000ES5 is a KrF (248nm) scanner built on Canon’s 300mm-ready FPA-6000 single-stage platform. It has an 0.80 numerical aperture and an ultra-low aberration 4:1 reduction lens system, capable of projecting IC features as small as 110nm. It is aimed at chip manufacturers moving processes to 110nm and 90nm nodes. The platform integrates two ultra-technologies, optical lithography and mechanical forces, to achieve an equal mastery of both.
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    CANON

    FPA-6000ES5

    verified-listing-icon

    Verified

    CATEGORY
    Steppers & Scanners

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    67288


    Wafer Sizes:

    Unknown


    Vintage:

    2003

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    CANON FPA-6000ES5

    CANON

    FPA-6000ES5

    Steppers & Scanners
    Vintage: 2003Condition: Used
    Last VerifiedOver 60 days ago

    CANON

    FPA-6000ES5

    verified-listing-icon
    Verified
    CATEGORY
    Steppers & Scanners
    Last Verified: Over 60 days ago
    listing-photo-23b4a048585449999e2acecd751f01ec-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52271/23b4a048585449999e2acecd751f01ec/25f50b35a8374c6ebde25c95afd026a4_b5c651c1a47645c49a2b802e51aaf9fb1201a_mw.jpeg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    67288


    Wafer Sizes:

    Unknown


    Vintage:

    2003


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The Canon FPA-6000ES5 is a KrF (248nm) scanner built on Canon’s 300mm-ready FPA-6000 single-stage platform. It has an 0.80 numerical aperture and an ultra-low aberration 4:1 reduction lens system, capable of projecting IC features as small as 110nm. It is aimed at chip manufacturers moving processes to 110nm and 90nm nodes. The platform integrates two ultra-technologies, optical lithography and mechanical forces, to achieve an equal mastery of both.
    Documents

    No documents

    Similar Listings
    View All
    CANON FPA-6000ES5

    CANON

    FPA-6000ES5

    Steppers & ScannersVintage: 2003Condition: UsedLast Verified: Over 60 days ago
    CANON FPA-6000ES5

    CANON

    FPA-6000ES5

    Steppers & ScannersVintage: 2003Condition: UsedLast Verified: Over 60 days ago
    CANON FPA-6000ES5

    CANON

    FPA-6000ES5

    Steppers & ScannersVintage: 0Condition: UsedLast Verified: 19 days ago