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LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" SEQUEL
    Description
    No description
    Configuration
    Tool is currently still in production. Tool is in good condition. Inspect to confirm configuration and condition. <b>C2 Single Sequel Shrink</b> Electrical Requirements : 208 VAC, 3 phase, 5-wire Wafer Size (inches) : 8  Wafer Type : Notch Stand Alone Install Type Software Version : C2 sequel 4.94 B15 RF Generator Rack  SSD  Serial Number: DLCM : C2-DLCM-S0309              Module A : C2-CVDD-S 4854        <b>DLCM</b> Signal Lamp Tower   IOC Version : 4.2 Integrated SMIF     Model : Asyst SMIF, LPT 2200 VTR 5 Robot SECS / GEMS  <b>Sequel Chamber</b> Process Type : STD Nitride Digital Dynamics IOC  Heated Valves  Gate Valve Mfg &amp; Model : Gate Valve Assy, Heated 4 Inch. Novellus RF Match Type : A.E. End Point Detector  RF Generators      Advanced Energy        RFG5500      Advanced Energy        PDX1400 <b>Pumps</b> Deposition Chamber Pump: Alcatel ADS 1202P Load Lock Pump: Alcatel A100L Transfer Chamber Pump: Alcatel A100L <b>Gas Box Configuration  </b>   Gas Line #    Gas                 Flow (sccm)        MFC Mfgr.       MFC Model 1                    SiH4               750                      Horiba             Z512 2                    N2                  5000                    Unit                 UFC1661 3                    2ND SiH4       350                      Horiba             Z512 4                    He                  10000                   Unit                 UFC1661 5                    NH3               10000                   Unit                  UFC1661 6                    He (Aux)        1000                     Unit                  UFC1661 7                    NF3                5000                    Unit                  UFC1661 8                    N2O                20000                 Unit                   UFC1661 9                    N2                  12000                  Unit                   UFC1661 10                  CO2                20000                 Unit                   UFC1661
    OEM Model Description
    The NOVELLUS CONCEPT TWO SEQUEL is a Reactors / MOCVD system that can produce wafer size of 8 inches. It was initially shipped in a single chamber version targeted at thin dielectric films used in volume 200mm IMD production applications.
    Documents

    No documents

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" SEQUEL

    verified-listing-icon

    Verified

    CATEGORY

    MOCVD
    Last Verified: Over 60 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    13438


    Wafer Sizes:

    8"/200mm


    Vintage:

    1998

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    Transaction Insured by Moov
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    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" SEQUEL

    verified-listing-icon

    Verified

    CATEGORY

    MOCVD
    Last Verified: Over 60 days ago
    listing-photo-6OR4nFPHetNh4O2GBKEv741YPKPQebf7fnJKr1I1GmQ-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    13438


    Wafer Sizes:

    8"/200mm


    Vintage:

    1998


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Tool is currently still in production. Tool is in good condition. Inspect to confirm configuration and condition. <b>C2 Single Sequel Shrink</b> Electrical Requirements : 208 VAC, 3 phase, 5-wire Wafer Size (inches) : 8  Wafer Type : Notch Stand Alone Install Type Software Version : C2 sequel 4.94 B15 RF Generator Rack  SSD  Serial Number: DLCM : C2-DLCM-S0309              Module A : C2-CVDD-S 4854        <b>DLCM</b> Signal Lamp Tower   IOC Version : 4.2 Integrated SMIF     Model : Asyst SMIF, LPT 2200 VTR 5 Robot SECS / GEMS  <b>Sequel Chamber</b> Process Type : STD Nitride Digital Dynamics IOC  Heated Valves  Gate Valve Mfg &amp; Model : Gate Valve Assy, Heated 4 Inch. Novellus RF Match Type : A.E. End Point Detector  RF Generators      Advanced Energy        RFG5500      Advanced Energy        PDX1400 <b>Pumps</b> Deposition Chamber Pump: Alcatel ADS 1202P Load Lock Pump: Alcatel A100L Transfer Chamber Pump: Alcatel A100L <b>Gas Box Configuration  </b>   Gas Line #    Gas                 Flow (sccm)        MFC Mfgr.       MFC Model 1                    SiH4               750                      Horiba             Z512 2                    N2                  5000                    Unit                 UFC1661 3                    2ND SiH4       350                      Horiba             Z512 4                    He                  10000                   Unit                 UFC1661 5                    NH3               10000                   Unit                  UFC1661 6                    He (Aux)        1000                     Unit                  UFC1661 7                    NF3                5000                    Unit                  UFC1661 8                    N2O                20000                 Unit                   UFC1661 9                    N2                  12000                  Unit                   UFC1661 10                  CO2                20000                 Unit                   UFC1661
    OEM Model Description
    The NOVELLUS CONCEPT TWO SEQUEL is a Reactors / MOCVD system that can produce wafer size of 8 inches. It was initially shipped in a single chamber version targeted at thin dielectric films used in volume 200mm IMD production applications.
    Documents

    No documents

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