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NIKON NSR-SF100
    Description
    No description
    Configuration
    • Inline left or right configuration available • Altitude: Varies by site • Lens Type: 4:1, 9M 4IL1 • Chamber Set Point Temperature: 22.2°C • Variable numerical aperture: 0.40-0.52 • Sigma Illuminator: 0.75 • 3.5kW Mercury ARC Lamp • Laser Step Alignment (LSA) • Phase Contrast Field Image Alignment (PCFIA) • AIS Focus Calibration • Active Vibration Isolation System • Reticle Size: 6 x 0.25 inches • Reticle Barcode Reader • Moveable Reticle Microscope • Pellicle Particle Detector (PPD3) • Wafer Loader with Type 3 Wafer Loader Controller • Ceramic Wafer Holder • Chip leveling (Multi-Point Focus/Level) • Extended wafer carrier table • Tool was used in a copper process line for polymide expose
    OEM Model Description
    The NIKON NSR SF100 is a Steppers and Scanners system. The NSR SF100 can be used with Wafer Size of 8”. The NSR SF100 design predicts the line configuration for 2001 and beyond, and responds with a high throughput of 80 plus wafers/hour on full-scale production lines using 300 mm wafers.
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    NIKON

    NSR-SF100

    verified-listing-icon

    Verified

    CATEGORY

    I-Line
    Last Verified: Over 60 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    23977


    Wafer Sizes:

    12"/300mm


    Vintage:

    Unknown

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    NIKON

    NSR-SF100

    verified-listing-icon

    Verified

    CATEGORY

    I-Line
    Last Verified: Over 60 days ago
    listing-photo-1cbb1a4a6c5842a6a9db72dda302482b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    23977


    Wafer Sizes:

    12"/300mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    • Inline left or right configuration available • Altitude: Varies by site • Lens Type: 4:1, 9M 4IL1 • Chamber Set Point Temperature: 22.2°C • Variable numerical aperture: 0.40-0.52 • Sigma Illuminator: 0.75 • 3.5kW Mercury ARC Lamp • Laser Step Alignment (LSA) • Phase Contrast Field Image Alignment (PCFIA) • AIS Focus Calibration • Active Vibration Isolation System • Reticle Size: 6 x 0.25 inches • Reticle Barcode Reader • Moveable Reticle Microscope • Pellicle Particle Detector (PPD3) • Wafer Loader with Type 3 Wafer Loader Controller • Ceramic Wafer Holder • Chip leveling (Multi-Point Focus/Level) • Extended wafer carrier table • Tool was used in a copper process line for polymide expose
    OEM Model Description
    The NIKON NSR SF100 is a Steppers and Scanners system. The NSR SF100 can be used with Wafer Size of 8”. The NSR SF100 design predicts the line configuration for 2001 and beyond, and responds with a high throughput of 80 plus wafers/hour on full-scale production lines using 300 mm wafers.
    Documents

    No documents

    Similar Listings
    View All

    No Similar Listings