Description
Film Thickness Measurement SystemConfiguration
No ConfigurationOEM Model Description
The NanoSpec 3000 film thickness measurement system is a state of the art, small spot spectroscopic reflectometer, built on a simple to use tabletop platform. A modern solid state linear diode array reflectometer is used to insure measurement speed and accuracy. The NanoSpec 3000 provides scanning from 480 to 800nm and can measure single-layer films such as oxide, nitride and photoresist, as well as multiple layer film stacks. Measurements can also be made on a \vide variety of other substrates including silicon, aluminum and gallium arsenide.Documents
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 3000
Verified
CATEGORY
Thin Film / Film Thickness
Last Verified: 14 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
113765
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 3000
CATEGORY
Thin Film / Film Thickness
Last Verified: 14 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
113765
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Film Thickness Measurement SystemConfiguration
No ConfigurationOEM Model Description
The NanoSpec 3000 film thickness measurement system is a state of the art, small spot spectroscopic reflectometer, built on a simple to use tabletop platform. A modern solid state linear diode array reflectometer is used to insure measurement speed and accuracy. The NanoSpec 3000 provides scanning from 480 to 800nm and can measure single-layer films such as oxide, nitride and photoresist, as well as multiple layer film stacks. Measurements can also be made on a \vide variety of other substrates including silicon, aluminum and gallium arsenide.Documents
No documents