Overview

The NSR-SF155 is the seventh generation SF system. Design optimizations enable the SF155 to deliver more than 200 wafers (300 mm) per hour. Same wide exposure field as KrF and ArF scanners (26 x 33 mm). The SF155 incorporates the advanced FIA system. The SF155 delivers overlay accuracy ≤ 25 nm. Skyhook Technology provides ample space to optimize airflow and temperature control, which improves lens stability. The SF155 uses optimized load and unload positioning to reduce wafer exchange time.