Nikon Precision Inc.'s NSR-1755i7A i-line stepper, with a 17.5 mm by 17.5 mm exposure area and a specified production resolution of 0.58 pm, is targeted for 4Mb and 16Mb DRAM production by system designers.

Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.

NIKON

NSR-1755i7A

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NIKON I-line lithography machine
Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.

NSR-1755i7A

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NSR-1755i7A