Description
No descriptionConfiguration
SW_RELEASE 080806 MAGIC_STRING tkwMWFU0{UN WAFER_STEPPER OPTIONS SECS KEY g|VcVAw4iVk REFL_IMAGE_SENSOR KEY g|VcVAw0yVk PEP_1_PRODUCTIVITY_UPGRADE KEY C2hq5DExVjP PEP_2_PRODUCTIVITY_UPGRADE KEY E6ZxUltzzgj RETICLE_ERROR_COMPENSATION KEY ezPvMVMFY8K FLATNESS_MODEL KEY wRRhwXm4D8R LSQ_DISTO_MODEL KEY oxPhQhQj60R MARK_SENSOR KEY ElVc1Qr|e4h BATCH_STREAMING KEY xK4jj9z78Ul INTENSITY_2 KEY L{{4XJJOUks FOCUS_MONITORING KEY Vk80bFKFgFv FOCAL_ADJUSTMENT KEY xK49L3zFwUl EXTENDED_EXPOSURE KEY x05F|7w29Vl FAST_TTL_ALIGNMENT KEY s5kl|kb8cIv PEP_LEVEL_ALIGNMENT_1 KEY 6lKCIhPxpyB PEP_WAFER_SWAP_4 KEY tHxoZuAW3VXOEM Model Description
Designed for mass production at 0.4 µm and achieves extremely high throughout while maintaining versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of subhalf-micron design rules by optimizing both depth of focus and resolution for critical process layers. NA:0.60Documents
No documents
ASML
PAS 5500/100D
Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
111837
Wafer Sizes:
6"/150mm
Vintage:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
ASML
PAS 5500/100D
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
111837
Wafer Sizes:
6"/150mm
Vintage:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
SW_RELEASE 080806 MAGIC_STRING tkwMWFU0{UN WAFER_STEPPER OPTIONS SECS KEY g|VcVAw4iVk REFL_IMAGE_SENSOR KEY g|VcVAw0yVk PEP_1_PRODUCTIVITY_UPGRADE KEY C2hq5DExVjP PEP_2_PRODUCTIVITY_UPGRADE KEY E6ZxUltzzgj RETICLE_ERROR_COMPENSATION KEY ezPvMVMFY8K FLATNESS_MODEL KEY wRRhwXm4D8R LSQ_DISTO_MODEL KEY oxPhQhQj60R MARK_SENSOR KEY ElVc1Qr|e4h BATCH_STREAMING KEY xK4jj9z78Ul INTENSITY_2 KEY L{{4XJJOUks FOCUS_MONITORING KEY Vk80bFKFgFv FOCAL_ADJUSTMENT KEY xK49L3zFwUl EXTENDED_EXPOSURE KEY x05F|7w29Vl FAST_TTL_ALIGNMENT KEY s5kl|kb8cIv PEP_LEVEL_ALIGNMENT_1 KEY 6lKCIhPxpyB PEP_WAFER_SWAP_4 KEY tHxoZuAW3VXOEM Model Description
Designed for mass production at 0.4 µm and achieves extremely high throughout while maintaining versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of subhalf-micron design rules by optimizing both depth of focus and resolution for critical process layers. NA:0.60Documents
No documents