Description
No descriptionConfiguration
Lamp intensity: 820.766 Uniformity: 2.55 Lens tilt: 0.196 LSA & FIA: X: 0.056 Y: 0.046 Reticle rotation: 1 Lens distortion: X: 0.014-0.038 Y: 0.030-0.045 Stepping: 0.018OEM Model Description
"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.Documents
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NIKON
NSR-2205i12D
Verified
CATEGORY
I-Line
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
29845
Wafer Sizes:
Unknown
Vintage:
Unknown
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NIKON
NSR-2205i12D
Verified
CATEGORY
I-Line
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
29845
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Lamp intensity: 820.766 Uniformity: 2.55 Lens tilt: 0.196 LSA & FIA: X: 0.056 Y: 0.046 Reticle rotation: 1 Lens distortion: X: 0.014-0.038 Y: 0.030-0.045 Stepping: 0.018OEM Model Description
"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.Documents
No documents