The system uses a carrier which measures about 6.75” OD.  It is designed for up to 150mm wafers (we used it for 100mm wafers and 1.5” square pieces).
 
Max temperature is unclear, the substrate is lamp heated from behind, and can be set for >700C.
 
4 guns, 3” targets.
 
5 power supplies, 4 for deposition, I am not sure of the sizes:
1ea RF substrate bias (<300W)
1ea integrated DC (AJA power supply)
2ea integrated RF (AJA supplies)
1ea AE Pinnacle Plus pulsed DC

AJA is a manufacturer of thin film deposition systems including magnetron sputtering, e-beam evaporation, thermal evaporation, and ion milling systems.

AJA INTERNATIONAL, INC

AJA INTERNATIONAL, INC’s ATC 1800 is a versatile PVD coating tool that can be built in a variety of configurations to satisfy most requirements. It is part of the ATC Flagship Series Sputtering Systems and is built around AJA’s unique A300-XP (UHV) or Stiletto Series (HV) magnetron sputtering sources which feature in-situ source head tilting allowing precise and repeatable con-focal, direct, and off-axis thin film deposition. The ATC 1800 can be built in a variety of configurations to satisfy most requirements. For example, it can be fitted with (5) 2" magnetrons with in-situ tilt. These versatile sputtering systems can also be fitted with other deposition sources (e-beam evaporation, thermal evaporation and PLD), ion sources, facing target sputtering sources (FTS), contact masking systems, metal-sealed tops, bake jackets, glove boxes, cassettes, auto-loading and analytical tools (RHEED, XPS, Auger, RGA, Ellipsometers and MOS).

ATC 1800-V

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AJA INTERNATIONAL, INC

ATC 1800-V

PVD / Sputtering

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ATC 1800-V

PVD / Sputtering

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