Description
FEI, FIB200 Ion Column: Magnum • i-Source: Ga LMIS • kV: 30kV, • Bc: 21nA Detectors • In chamber: (CDEM) Continuous Diode Electron Multiplier for ion imaging Chamber & Stage • Sample load: Front door 5-axes motorized stage, manual eucentric tilt will be supplied • XYZ: 50 x 50 x 10mm, T: -20 +60, R: n x 360 • Ports for analytical or probing applications • In Chamber CCD Gas Injection System (GIS) • Max 2 GIS • 1 GIS Pt and EE included Microscope Control windows NT 4.0 Vacuum System • Modes: 1 IGP pump • Pumps: vacuum pump Ancillary Equipment • Air: house or compressor REQUIRED, Included "Used/Tested" • Nitrogen: OPTIONAL, Customer providesConfiguration
This is currently working online, configured as: magnum column, 2GIS: EE, PT, CDEM, stage: 5-axis, Windows NT 4.0OEM Model Description
The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.Documents
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THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 200
Verified
CATEGORY
SEM
Last Verified: 11 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
87170
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 200
CATEGORY
SEM
Last Verified: 11 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
87170
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
FEI, FIB200 Ion Column: Magnum • i-Source: Ga LMIS • kV: 30kV, • Bc: 21nA Detectors • In chamber: (CDEM) Continuous Diode Electron Multiplier for ion imaging Chamber & Stage • Sample load: Front door 5-axes motorized stage, manual eucentric tilt will be supplied • XYZ: 50 x 50 x 10mm, T: -20 +60, R: n x 360 • Ports for analytical or probing applications • In Chamber CCD Gas Injection System (GIS) • Max 2 GIS • 1 GIS Pt and EE included Microscope Control windows NT 4.0 Vacuum System • Modes: 1 IGP pump • Pumps: vacuum pump Ancillary Equipment • Air: house or compressor REQUIRED, Included "Used/Tested" • Nitrogen: OPTIONAL, Customer providesConfiguration
This is currently working online, configured as: magnum column, 2GIS: EE, PT, CDEM, stage: 5-axis, Windows NT 4.0OEM Model Description
The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.Documents
No documents