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AIMS EUV
Category
Reticle / Mask InspectionOverview
Platform for actinic EUV measurements provides full emulation Provides full emulation of the scanner imaging conditions for the NXE:3xy0 scanner systems, with extension capability to next generation EXE:5000 high-NA scanner systems. With its high precision stage for defect location accuracy and the employment of an EUV plasma source, AIMS EUV meets the industry production requirements for manufacturing defect-free EUV photomasks.
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