LDS3000
Category
Reticle / Mask InspectionOverview
The LDS 3000 allows fully automatic defect monitoring in all process steps. All types of yield limiting visual defects on single layer or multi-layer patterned wafers will be detected, including thin film-, photo-, -etch- and the cleaning-process will be detected. Beside the micro the LDS 3000 can be equipped optionally also with fully automatic macro inspection.
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