Description
No descriptionConfiguration
-Software Version 5.65B38_1.80B27 -CIM E84, SECS/GEM, GEM300, INTERFACE A -Process TFM_TiN-HM Dep -Main System Novellus_TiNMetalDepOEM Model Description
The INOVA NExT, a 300mm metallization system designed to deposit highly conformal copper barrier-seed films at 45 nanometers and beyond. On the INOVA NExT, the single target HCM technology has been extended to the 45 nanometer node; the system also features an integrated ion-induced atomic layer deposition (iALD) module to deposit tantalum nitride (TaN) barrier films below 45 nanometers.Documents
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LAM RESEARCH / NOVELLUS
INOVA NExT
Verified
CATEGORY
PVD / Sputtering
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
106057
Wafer Sizes:
12"/300mm
Vintage:
2013
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / NOVELLUS
INOVA NExT
CATEGORY
PVD / Sputtering
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
106057
Wafer Sizes:
12"/300mm
Vintage:
2013
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
-Software Version 5.65B38_1.80B27 -CIM E84, SECS/GEM, GEM300, INTERFACE A -Process TFM_TiN-HM Dep -Main System Novellus_TiNMetalDepOEM Model Description
The INOVA NExT, a 300mm metallization system designed to deposit highly conformal copper barrier-seed films at 45 nanometers and beyond. On the INOVA NExT, the single target HCM technology has been extended to the 45 nanometer node; the system also features an integrated ion-induced atomic layer deposition (iALD) module to deposit tantalum nitride (TaN) barrier films below 45 nanometers.Documents
No documents