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ATC 2200-H
Category
PVD / SputteringOverview
ATC 2200-H Horizontal Sputter Coater. Capable of coating concave, 25 mm thick, X-ray mirror substrates up to 300 mm in diameter with +/- 2% uniformity utilizing (4) in-situ tilt sputter guns. The substrate carrier can also be replaced by planetary tooling for a batch of 3D objects or small wafers or coupons.
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