Dopant concentration as a function of depth.

ONTO / NANOMETRICS / ACCENT / BIO-RAD

PN4400

With tighter wafer-to-wafer and within-wafer uniformity tolerances, integrated metrology systems are in use across various semiconductor processing steps. Based on demonstrated high-resolution optical technology, the IMPULSE V system provides higher sensitivity to thin film residue measurements during the CMP process. This next generation IMPULSE V system extends this reliability at a significantly higher throughput, staying in sync with the need for higher sampling, in-die / on-device and wafer edge measurements. The advanced optics and specifically designed measurement chamber offer a significant improvement in signal to noise ratio (SNR), achieving a >2X improvement in precision over the previous generation of integrated metrology. On-board machine learning uses the additional SNR to complete this powerful package, enabling a faster time-to-solution as well as closing the gap on layers that were previously unmeasurable by the existing toolset.

IMPULSE V

The IMPULSE+ and IMPULSE represent our latest metrology platform for OCD, and thin film metrology, and have been successfully qualified on numerous independent Wafer Fabrication Equipment Suppliers’ platforms.

IMPULSE+

The IMPULSE is our newest metrology platform for OCD measurement and profiling as well as employing a DUV channel for film thickness. The combined technologies provide a complete measurement solution over the entire range of measurement requirements for each process step. This complete metrology capability can be utilized across a number of lithography, deposition, copper planarization, dielectric planarization, poly-Si etch and dielectric etch applications. The platform enables higher performance and higher reliability for both Integrated applications as well as on the Lynx platform as a standalone tool enabling cluster metrology for high throughput. IMPULSE leverages the success of the 9010 platform with improved process control beyond 45nm and higher throughput for lower cost of ownership.

IMPULSE

ECVPro™ is an advanced Electrochemical Capacitance Voltage (ECV) profiler that redefines ECV profiling. With 25 years of ECV profiling experience and advances in instrument control technology, the ECVPro is the most precise, reproducible, and highly-automated electrochemical CV profiler ever. The patent-pending design eliminates operator dependent variations in the data, allowing for easy operation and accurate results. One of the key features of the ECVPro is the introduction of the first ever in-situ camera, ECVision™, which allows for real-time imaging of the semiconductor/electrolyte interface. This provides unprecedented levels of control and insight into what occurs at the sample surface during a measurement. For those working with III-Nitrides, the ECVPro GaN option extends the performance of the system for optimal profiling of GaN, InGaN, and AlGaN. With its advanced technology and ease of use, the ECVPro is a valuable tool for anyone in need of precise and accurate ECV profiling.

ECV Pro

NanoCLP 9010 optical laser profiler for copper metal loss measurement. The first product offered in the series is the NanoCLP 9010 is a laser-based, optical profiling and reflectance measurement system that incorporates the newly developed Copper Laser Profiler (CLP) technology for the measurement of copper metal loss during chemical mechanical planarization on semiconductor wafers and is designed for integration into semiconductor wafer processing equipment. The system also incorporates our unique 300 millimeter edge-gripping wafer stage with an integral pre-aligner.

NanoCLP 9010

The 9010T is an advanced, integrated metrology platform for optical CD measurement and profiling. The 9010T system is designed to be incorporated into semiconductor equipment requiring leading-edge CD metrology for semiconductor applications. The 9010T offers an extended wavelength range down to 210nm, extending the CD measurement capabilities for line width structures down to 65nm. The system also incorporates the UV film thickness function, and its improved design offers a faster, more cost effective integrated CD measurement solution with increased throughput. The system is also offered as the 9010T/b, in the SEMI BOLTS configuration for easy installation directly onto the OEM process equipment’s standard 300mm loadport.

NANO 9010T/b

The 9010Tx is an advanced, integrated metrology platform for optical CD measurement and profiling. The 9010Tx system is designed to be incorporated into semiconductor equipment requiring leading-edge CD metrology for semiconductor applications. The 9010Tx offers an extended wavelength range down to 210nm, extending the CD measurement capabilities for line width structures down to 65nm. The system also incorporates the UV film thickness function, and its improved design offers a faster, more cost effective.

NANO 9010Tx

PN 4300PC

The 9010T is an advanced, integrated metrology platform for optical CD measurement and profiling. The 9010T system is designed to be incorporated into semiconductor equipment requiring leading-edge CD metrology for semiconductor applications. The 9010T offers an extended wavelength range down to 210nm, extending the CD measurement capabilities for line width structures down to 65nm. The system also incorporates the UV film thickness function, and its improved design offers a faster, more cost effective integrated CD measurement solution with increased throughput.

ONTO / NANOMETRICS / ACCENT / BIO-RAD

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