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KLA 1530
    Description
    Temperature Monitoring
    Configuration
    No Configuration
    OEM Model Description
    The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C
    Documents

    No documents

    KLA

    1530

    verified-listing-icon

    Verified

    CATEGORY
    Probers

    Last Verified: 15 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    91949

    Wafer Sizes:

    8"/200mm

    Vintage:

    Unknown

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    KLA 1530

    KLA

    1530

    Probers
    Vintage: 0Condition: Used
    Last Verified15 days ago

    KLA

    1530

    verified-listing-icon
    Verified
    CATEGORY
    Probers
    Last Verified: 15 days ago
    listing-photo-0b4db008aabc419ab706d45753be46c9-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    91949

    Wafer Sizes:

    8"/200mm

    Vintage:

    Unknown

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Temperature Monitoring
    Configuration
    No Configuration
    OEM Model Description
    The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C
    Documents

    No documents

    Similar Listings
    View All
    KLA 1530

    KLA

    1530

    ProbersVintage: 0Condition: UsedLast Verified:15 days ago