The NOVA®-25A 2.5 kW, 2 MHz RF Plasma Generator offers advanced RF plasma generation and control for low cost and high yield in the most demanding thin film processing applications. NOVA RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.

NOVA-25A

DSS CW2 V2	

PDR-C-1C	

FS-100

ASTEX AX 8500

Integrated remote plasma source AX7695 - on wafer processing, higher flow rates, lowest cost “clean” source of atomic radicals.

R*evolution III

EDGE 1513A

EDGE6513A

EDGE 1527A

ACG-6B-01

EDGE 2502A

AX8403A

GHW-12

AX8403

OEM-25A	

MWJ-1213

AX8575

AX7690PSK-04

B-5002-12054	

AX8561RH

AX7710MKS

Cleanline ISO80

The GHW12 13.56 MHz, 1.25 kW, RF Plasma Generator is ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications. GHW Series RF Plasma Generators are available at 208 VAC and 400/480 VAC. GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices. All MKS Instruments' RF Generators are NRTL certified and CE marked.

GHW-50

D103

EDGE30R40A

247C

OEM-12B-06	

OEM-25XL	

The NOVA®-50A 5.0 kW 2 MHz RF Plasma Generator is ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications. NOVA RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.

NOVA-50A

Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination.

R*evolution

DCG-200Z	

OEM-650A	

FI20162-1	

AX7657-2	

AX3063	

DCS80-13E

GEW-3540	

The AX8407 SEMOZON® is a high concentration, ultra-clean ozone generator. Through design enhancements, SEMOZON® AX8407 extends the capability of patented MKS cell technology and production-proven design providing the highest performance for its size. AX8407 is the highest purity ozone generator on the market. It converts pure oxygen into ozone through silent electrical discharge and achieves the highest output concentration levels available. It requires only minute levels of dopant nitrogen gas, far below the levels required for competitive ozone generators. As a result, the ozone is ultra-clean and the presence of contaminants, e.g. NOx compounds, is extremely low. Ozone is an environmentally friendly alternative to many chemical processes. It has a high redox potential, can be generated at the point of use and is easily converted back to oxygen. Typical semiconductor ozone applications include TEOS/Ozone CVD, Ta2O5 CVD, photoresist strip, wafer cleaning, contaminant removal, surface conditioning, oxide growth, and ALD. Ozone is also ideally suited for use in pharmaceutical and water processing applications including cleaning, sterilization and disinfection, as well as Clean-In-Place (CIP).



AX8407

GHW-12Z	

GHW-50Z	

GHW-85A	

FI20612

ASTRONex	

D13449	

OEM-12	

NW 100

113BJ1-P

AX3151	

MWH-100-01M6

OEM-6AM-1B	

150R40A-D01

AX3063ULVJ	

PR 4000

AX7650	

LIQUOZON XF L13

AX3060-1	

OEM-6A-01	

Remote Plasma Source for On-Wafer Processing

AX7690

PC-3G

AX9004	

FI20160-1	

AX7700-10

B-3013	

FI20609	

GL-139	

OEM-25G

FI20608

The GHW25 13.56 MHz, 2.5 kW, RF Plasma Generator is available with Auto-Frequency Tuning for fixed matching networks, resulting in faster tuning and lower system cost. GHW Series RF Plasma Generators are available at 208 VAC and 400/480 VAC. GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices. All MKS Instruments' RF Generators are NRTL certified and CE marked.

GHW-25

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