200x200mm area (2 to 8 inch wafer) photoluminescence, epitaxial layer thickness mapping, wafer curvature measurement system and more for LED/LD, sensor materials, phosphors in R&D and production. Multiple options for pre-installed photoluminescence laser excitation sources, transmitivity, reflectivity measurement in one extremely compact design.


YSYSTEMS

SEMILAB

5130

EPIPLUS / ETAMAX

PLATOM

• Simultaneous measurement of 3-channel photoluminescence and 1-channel DIC laser microscopy using a 355nm laser source
• Deep learning for defect analysis
• DIC Laser Microscopy Surface Inspection
  – Reflected DIC laser microscope of excitation source (355nm)
  – Carrot, Scratch, Droplets, 3-C triangular defects
• Band edge PL inspection method, additional 2 types of data for user reference
  – BPD, Shockley stacking faults, Bar type stacking faults
• Photoluminescence spectral mapping with spectrometer
  – Whole wafer mapping
  – Spectroscopic analysis for aimed area in map data
• Auto-Navigation Function
  – Auto-defect inspection using spectral measurement using PMT mapping and image processing result
  – Exact stacking faults classification by spectrum analysis

Photoluminescence Mapper

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