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OXFORD PLASMALAB 100
  • OXFORD PLASMALAB 100
  • OXFORD PLASMALAB 100
  • OXFORD PLASMALAB 100
  • OXFORD PLASMALAB 100
  • OXFORD PLASMALAB 100
  • OXFORD PLASMALAB 100
  • OXFORD PLASMALAB 100
Description
Overhaul done System Condition : working state (dismantled and packed)
Configuration
Gas supply (PECVD) . MFC_MKS 1479A --- corrosive gas: 5%SiH4/N2, NH3 . MFC_MKS 1179A --- non-corrosive gas: CF4, N2, N2O Gas supply (ICP-RIE) . MFC_MKS 1479A --- corrosive gas: Cl2, BCl3 , HBr (SiCl4) . MFC_MKS 1179A --- non-corrosive gas: O2, Ar, SF6 . 415V Heated Gas Kit --- required as SiCl4, BCl3, C4F8
OEM Model Description
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
Documents
CATEGORY
PECVD

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

112074


Wafer Sizes:

6"/150mm, 8"/200mm


Vintage:

2009


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

OXFORD

PLASMALAB 100

verified-listing-icon
Verified
CATEGORY
PECVD
Last Verified: Over 60 days ago
listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/9d260e74ef324c95ac19626371e0c51b_pecvdicprieoxfordplasmasystem100page04image0001_mw.jpg
listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/ed933e16946740b3b88d3a787bf4425b_pecvdicprieoxfordplasmasystem100page06image0001_mw.jpg
listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/4b1929a0e9d447748e0d922c0c5deb50_pecvdicprieoxfordplasmasystem100page08image0001_mw.jpg
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listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/fae6286f239b4bdd950f7209f02a4fc1_pecvdicprieoxfordplasmasystem100page07image0001_mw.jpg
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Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

112074


Wafer Sizes:

6"/150mm, 8"/200mm


Vintage:

2009


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Overhaul done System Condition : working state (dismantled and packed)
Configuration
Gas supply (PECVD) . MFC_MKS 1479A --- corrosive gas: 5%SiH4/N2, NH3 . MFC_MKS 1179A --- non-corrosive gas: CF4, N2, N2O Gas supply (ICP-RIE) . MFC_MKS 1479A --- corrosive gas: Cl2, BCl3 , HBr (SiCl4) . MFC_MKS 1179A --- non-corrosive gas: O2, Ar, SF6 . 415V Heated Gas Kit --- required as SiCl4, BCl3, C4F8
OEM Model Description
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
Documents