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OXFORD PLASMALAB 100
    Description
    Overhaul done System Condition : working state (dismantled and packed)
    Configuration
    Gas supply (PECVD) . MFC_MKS 1479A --- corrosive gas: 5%SiH4/N2, NH3 . MFC_MKS 1179A --- non-corrosive gas: CF4, N2, N2O Gas supply (ICP-RIE) . MFC_MKS 1479A --- corrosive gas: Cl2, BCl3 , HBr (SiCl4) . MFC_MKS 1179A --- non-corrosive gas: O2, Ar, SF6 . 415V Heated Gas Kit --- required as SiCl4, BCl3, C4F8
    OEM Model Description
    The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
    Documents

    OXFORD

    PLASMALAB 100

    verified-listing-icon

    Verified

    CATEGORY
    PECVD

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    112074


    Wafer Sizes:

    6"/150mm, 8"/200mm


    Vintage:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVD
    Vintage: 0Condition: Used
    Last Verified15 days ago

    OXFORD

    PLASMALAB 100

    verified-listing-icon
    Verified
    CATEGORY
    PECVD
    Last Verified: Over 60 days ago
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/9d260e74ef324c95ac19626371e0c51b_pecvdicprieoxfordplasmasystem100page04image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/ed933e16946740b3b88d3a787bf4425b_pecvdicprieoxfordplasmasystem100page06image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/4b1929a0e9d447748e0d922c0c5deb50_pecvdicprieoxfordplasmasystem100page08image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/786a902c042b4149b021dab7abd98f82_pecvdicprieoxfordplasmasystem100page02image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/7562b60e3d424ca29ff0eb9108fadab4_pecvdicprieoxfordplasmasystem100page03image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/fae6286f239b4bdd950f7209f02a4fc1_pecvdicprieoxfordplasmasystem100page07image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/7e8afa5519e84cc085a4cb3a3ec7b90b_pecvdicprieoxfordplasmasystem100page05image0001_mw.jpg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    112074


    Wafer Sizes:

    6"/150mm, 8"/200mm


    Vintage:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Overhaul done System Condition : working state (dismantled and packed)
    Configuration
    Gas supply (PECVD) . MFC_MKS 1479A --- corrosive gas: 5%SiH4/N2, NH3 . MFC_MKS 1179A --- non-corrosive gas: CF4, N2, N2O Gas supply (ICP-RIE) . MFC_MKS 1479A --- corrosive gas: Cl2, BCl3 , HBr (SiCl4) . MFC_MKS 1179A --- non-corrosive gas: O2, Ar, SF6 . 415V Heated Gas Kit --- required as SiCl4, BCl3, C4F8
    OEM Model Description
    The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
    Documents
    Similar Listings
    View All
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVDVintage: 0Condition: UsedLast Verified:15 days ago
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVDVintage: 0Condition: UsedLast Verified:12 days ago
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVDVintage: 0Condition: UsedLast Verified:Over 30 days ago