IVS 120 - Optical Overlay and CD metrology system, 4" to 8"
MetroBoost

Fully automatic
(3) Cassettes

Overlay registration feature types:
Multi-layer box, frame, bar type alignment marks with 10 microns inner and 20 microns outer
dimensions
Vernier and OMS alignment marks

Dynamic precision: &lt;/= 3 nm, 3 phase
Tool induced shift: &lt;/= 2 nm using patented calibration technique

CD measurement feature types:
Lines, spaces, line / space pairs

Feature range: 0.5 to 75 microns (optional lens may be required)
Dynamic precision: 12 nm, 3 phase dynamic repeatability or 1%, whichever is greater

Wafer handling:
SEMI standard wafers with flats or notches
Number of cassettes: (3) cassette stations, standard
Wafer transport: R, Z, theta pick and place robot with back side contact only

Optics:
Illumination source:
Special long life 100 watt 12V tungsten halogen lamp
Semi-annual replacement

Objectives:

Standard: 5x, 20x, 100x
Optional: 50x, 150x

Focus: fully automatic or manual, surface or edge contrast focus

Automation:
Throughput: &gt;/= 85 wafers per hour for CD / overlay, 5 measurements per wafer
Pattern recognition: 99%+ probability of detection with measurement gate positioning to 0.05 micron
Flexibility:
CD and overlay measurements in a single job plan
Dynamic job queuing

Cleanliness:
Class 1 compatible, &lt;/= 0.01 particles added per square centimeter, per wafer pass, measuring particles
&gt;/= 0.3 micron

Data management:
Controller: computer with Pentium processor
Storage: 2.1 GB hard drive, 3.5&quot; floppy drive, 3 GB tape backup drive (compressed)
Printer: clean room compatible thermal video / text printer

Options:
Integrated single or dual SMIF configurations
Real-time wafer stepper optimization software
GEM / SECS II communications
Ethernet supported by NOVELL NetWare
Spare parts kit

System hardware:

Measurement module and control console
Optical microscope with 5x, 20x, and 100x objectives
Digital image processor
System controller
Pattern recognition system
Camera
FSF and edge contrast focus systems
X/Y/Z stage designed to handle SEMI standard wafers up to 8”
Automated wafer handler:
Pick and place robot
Pre-aligner
(3) Cassette stations for production wafers: 4”, 5”,6”, and 8” capable
IVS system software:
Accuvision operation system software
Overlay registration measurement package for box and/or frame type alignment marks
Critical dimension measurement package
User programmable statistical analysis capability by site, wafer, and lot
Documentation package:
(1) User guide
(1) Maintenance manual

Power Requirements:
Common Mode Isolation
Input Voltage: 105 Volts to 125 Volts VAC
Output Load Current: 15 Amps
Output Rating: 1800 VA
Load Regulation: ± 2% of Input Voltage
Inrush Current at 1/2 Cycle: 400 Amps
Surge Current (1 second typical): 80 Amps

Surge Current (5 seconds typical): 40 Amps
1 Khz Forward Transfer Impedance: &lt; 1.9 Ohms

Transient Response:
Normal Mode: Min 40dB attenuation to 50Mhz
Response Time: Less than 5 nanoseconds

Air:
90 psi, 2 cfm, hose fitting ¼ inch O.D.
Oil Free Dry Filtered Down to 3 micron Particle Size
Vacuum: -24 to -27 in. Hg, 0.8 cfm, hose fitting ¼ inch O.D.
Humidity: 35 to 50 percent (non-condensing, ± 5 percent)
Temperature range: 65°F to 75°F, ± 2°F
Vibration: should not exceed:
2.0 microns peak-to-peak below 7 Hz
0.5 microns peak-to-peak 7 Hz to 150 Hz
2.0 microns peak-to-peak above 150 Hz

ONTO / INSPECTROLOGY / SCHLUMBERGER

IVS-120

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ONTO / INSPECTROLOGY / SCHLUMBERGER

IVS-120

Overlay

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