ONTO / INSPECTROLOGY / SCHLUMBERGER IVS-120

Description

IVS 120 - Optical Overlay and CD metrology system, 4" to 8" MetroBoost Fully automatic (3) Cassettes Overlay registration feature types: Multi-layer box, frame, bar type alignment marks with 10 microns inner and 20 microns outer dimensions Vernier and OMS alignment marks Dynamic precision: </= 3 nm, 3 phase Tool induced shift: </= 2 nm using patented calibration technique CD measurement feature types: Lines, spaces, line / space pairs Feature range: 0.5 to 75 microns (optional lens may be required) Dynamic precision: 12 nm, 3 phase dynamic repeatability or 1%, whichever is greater Wafer handling: SEMI standard wafers with flats or notches Number of cassettes: (3) cassette stations, standard Wafer transport: R, Z, theta pick and place robot with back side contact only Optics: Illumination source: Special long life 100 watt 12V tungsten halogen lamp Semi-annual replacement Objectives: Standard: 5x, 20x, 100x Optional: 50x, 150x Focus: fully automatic or manual, surface or edge contrast focus Automation: Throughput: >/= 85 wafers per hour for CD / overlay, 5 measurements per wafer Pattern recognition: 99%+ probability of detection with measurement gate positioning to 0.05 micron Flexibility: CD and overlay measurements in a single job plan Dynamic job queuing Cleanliness: Class 1 compatible, </= 0.01 particles added per square centimeter, per wafer pass, measuring particles >/= 0.3 micron Data management: Controller: computer with Pentium processor Storage: 2.1 GB hard drive, 3.5" floppy drive, 3 GB tape backup drive (compressed) Printer: clean room compatible thermal video / text printer Options: Integrated single or dual SMIF configurations Real-time wafer stepper optimization software GEM / SECS II communications Ethernet supported by NOVELL NetWare Spare parts kit System hardware: Measurement module and control console Optical microscope with 5x, 20x, and 100x objectives Digital image processor System controller Pattern recognition system Camera FSF and edge contrast focus systems X/Y/Z stage designed to handle SEMI standard wafers up to 8” Automated wafer handler: Pick and place robot Pre-aligner (3) Cassette stations for production wafers: 4”, 5”,6”, and 8” capable IVS system software: Accuvision operation system software Overlay registration measurement package for box and/or frame type alignment marks Critical dimension measurement package User programmable statistical analysis capability by site, wafer, and lot Documentation package: (1) User guide (1) Maintenance manual Power Requirements: Common Mode Isolation Input Voltage: 105 Volts to 125 Volts VAC Output Load Current: 15 Amps Output Rating: 1800 VA Load Regulation: ± 2% of Input Voltage Inrush Current at 1/2 Cycle: 400 Amps Surge Current (1 second typical): 80 Amps Surge Current (5 seconds typical): 40 Amps 1 Khz Forward Transfer Impedance: < 1.9 Ohms Transient Response: Normal Mode: Min 40dB attenuation to 50Mhz Response Time: Less than 5 nanoseconds Air: 90 psi, 2 cfm, hose fitting ¼ inch O.D. Oil Free Dry Filtered Down to 3 micron Particle Size Vacuum: -24 to -27 in. Hg, 0.8 cfm, hose fitting ¼ inch O.D. Humidity: 35 to 50 percent (non-condensing, ± 5 percent) Temperature range: 65°F to 75°F, ± 2°F Vibration: should not exceed: 2.0 microns peak-to-peak below 7 Hz 0.5 microns peak-to-peak 7 Hz to 150 Hz 2.0 microns peak-to-peak above 150 Hz