Description
No descriptionConfiguration
Model 2600 G3 HT Software Version CACE 3.5.0286 PLC 3.7 SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 7 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, DIPTe x 1, CBr4 x 1 Hydride Sources PH3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison5 x 3 for TMIn Chiller Baths ‐ Purifiers Entegris getter for H2 & N2 Filters Entegris filters for AsH3 & PH3 Heating System RF Coil with Trumpf Huttinger RF Generator BIG 120/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SDE300 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 HT MOCVD Reactor Specifications 6” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry Laytec EpiTT with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBDOEM Model Description
AIX 2600 G3, could accommodate 24 2-inch wafers.Documents
No documents
Verified
CATEGORY
MOCVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
125706
Wafer Sizes:
Unknown
Vintage:
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AIXTRON
AIX 2600 G3 HT
CATEGORY
MOCVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
125706
Wafer Sizes:
Unknown
Vintage:
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Model 2600 G3 HT Software Version CACE 3.5.0286 PLC 3.7 SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 7 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, DIPTe x 1, CBr4 x 1 Hydride Sources PH3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison5 x 3 for TMIn Chiller Baths ‐ Purifiers Entegris getter for H2 & N2 Filters Entegris filters for AsH3 & PH3 Heating System RF Coil with Trumpf Huttinger RF Generator BIG 120/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SDE300 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 HT MOCVD Reactor Specifications 6” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry Laytec EpiTT with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBDOEM Model Description
AIX 2600 G3, could accommodate 24 2-inch wafers.Documents
No documents