Description

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Configuration

Model 2600 G3 HT IC Software Version AIXACT 7.4.1.9 PLC 3.12.1 SLC ‐ Process InGaN MOCVD Epitaxy Wafer Config & Size 6 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TEGax2, TMAl x 1, Cp2Mg x 1, future x 3 Hydride Sources NH3 x 3, 100 ppm SiH4 in Ar x 2, future x 2 Concentration Monitors Epison4 x 3 for TMIn, Epison4 x 1 for TMAl Chiller Baths 6 available for MO Sources Purifiers Entegris getters for NH3, H2 & N2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 120/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Ebara ESA70W or ESA80W DOR & Glove Box Pumps Adixen ACP‐15(G) x 2 Aixtron 2600 G3 HT IC MOCVD Reactor Specifications Abatement Unisem UN2000A‐WHG (single or shared across 2 reactors) Reactor Chiller Tek‐Temp Recirculating Closed Loop Chiller Ceiling Ceiling temperature control. Custom Built Automatic Ceiling Loader In‐Situ Pyrometry Laytec Pyro400 with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Individual GFR control for each puck Spare Channels 23 spare MFC channels & 10 spare valve output channels Spare Parts Potentially some available