Description
Non-contact electrical C-V & I-V measurement system capable of measuring on product wafers. Measurements can be made in scribe line test sites or in the active cell area. Cell measurements allow for the first time in-line electrical monitoring of topology related processing issues. Major applications include measurements of SiO2, Nitrided Oxides, advanced high-K and low-K dielectricsConfiguration
No ConfigurationOEM Model Description
The SEMILAB FAaST 200 SL is a Wafer Mask Inspection system. The FAaST 200 SL can produce wafer size of 8” and Measurements can be made in scribe line test sites or in the active cell area. Cell measurements allow for the first time in-line electrical monitoring of topology related processing issuesDocuments
No documents
SEMILAB
FAAST 200 SL
Verified
CATEGORY
Metrology
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
23624
Wafer Sizes:
8"/200mm
Vintage:
Unknown
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Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
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Refurbishment Services
Available
SEMILAB
FAAST 200 SL
CATEGORY
Metrology
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
23624
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Non-contact electrical C-V & I-V measurement system capable of measuring on product wafers. Measurements can be made in scribe line test sites or in the active cell area. Cell measurements allow for the first time in-line electrical monitoring of topology related processing issues. Major applications include measurements of SiO2, Nitrided Oxides, advanced high-K and low-K dielectricsConfiguration
No ConfigurationOEM Model Description
The SEMILAB FAaST 200 SL is a Wafer Mask Inspection system. The FAaST 200 SL can produce wafer size of 8” and Measurements can be made in scribe line test sites or in the active cell area. Cell measurements allow for the first time in-line electrical monitoring of topology related processing issuesDocuments
No documents