The Archer 100 optical overlay control system is a cost-effective and high-performance solution for advanced design rules and immersion lithography. It has a lower total measurement uncertainty, improved tool utilization, and is extendible to address future lithography challenges. It also features automatic recipe optimization to minimize human error and free up fab resources.

KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

ARCHER 100

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