Description
E-beam LithographyConfiguration
• 50 keV beam energy LaB6 gun • High-precision stage featuring a traverse range of 210mm X 210mm • Lambda/1024 (0.6nm) laser interferometer resolution for position measurement • Fully automated Outer Handling System (OHS) to perform Pod-to-Pod (SMIF) substrate handling including pre-alignment of substrates • OHS is equipped with two (2) loadports for up to 150mm wafers, interfaced to an ISO class 4 mini environment which can be prepared for CAR on request (amine filter) • OHS has storage capacity of up to 10 holders (holder library) • Four (4) titanium wafer holders for 10mm wafers equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness and Four titanium holders for 150mm equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness. • OHS to allow automated wafer handling directly from customer wafer carriers via SMIF pods. • High speed variable shape beam and vector scan writing principle • High throughput "write-on-the-fly" working principle • Multi-pass writing • Minimum writing address grid: 1nm • Pattern data storage capacity by a RAID system of 2 Tbyte • Sbvis: visualization software for pattern data formats • Mark Detection Software Package (MDSP) including Image Field MetricOEM Model Description
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VISTEC
SB254
Verified
CATEGORY
Lithography
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116430
Wafer Sizes:
6"/150mm
Vintage:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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VISTEC
SB254
CATEGORY
Lithography
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116430
Wafer Sizes:
6"/150mm
Vintage:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available