Hitachi High-Tech offers a range of advanced industrial equipment solutions for assembly and processing machines used in the production of lithium batteries, auto parts and advanced film. Also offered R&D equipment necessary for the development of FC, organic materials, and catalyst materials.

The Hitachi IM4000Plus Ar ion milling system provides two milling configurations in a single instrument.

Previously two separate systems were needed to perform both cross section cutting (E-3500) and wide-area sample surface fine polishing (IM3000), but with Hitachi's IM4000Plus, both applications can be run within the same machine.

The IM4000Plus Ion Milling System utilizes a broad, low-energy Ar+ ion beam milling method to produce wider, undistorted cross-section milling or flat milling, without applying mechanical stress to the sample.

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IM4000 PLUS

Single wafer type ion beam etching machine

IML-6-1

IML-2-1

Single wafer type ion beam etching machine
Ion source size: Φ200

IML-5-1

IM4000 features a removable specimen holder that allows for both cross-section milling, where the ion beam irradiates the specimen from above and cuts a planar cross section through the specimen along the edge of a mask located between the specimen and ion gun, and flat milling, where a wide and smooth surface of approximately 5mm in diameter is achieved by shifting the ion beam axis and specimen rotational axis, and irradiating the specimen from an angle between 30–80°. The IM4000 also features a high milling rate ion gun with a processing speed of 300µm/hr (3 times faster than previous models**) that dramatically reduces the time required for time-consuming cross-section milling. 

IM4000

The ArBlade 5000 is equipped with a fast-milling Ar ion gun with a milling rate twice as high for cutting-edge performance, thus dramatically reducing the processing time for cross-section preparation.

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