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CENTURA DPS

Category
Plasma Etch
Overview

The AMAT Centura DPS is a highly efficient semiconductor processing system with a unique architecture that groups four processing stations and two auxiliary chambers around a central transfer module housing an ultra-reliable magnetically-coupled vacuum robot. It is designed for ≤200mm wafer fabrication and supports various applications such as Chemical Vapor Deposition (CVD), epitaxy, etch, plasma nitridation, and Rapid Thermal Processing (RTP).

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