KOKUSAI-ELECTRIC (KE)

VR-70

The SSM 530 is a fully automatic mapping system that provides a variety of electrical characterization measurements for non-patterned wafers used in epitaxial silicon production and front-end semiconductor processing. It has the same abilities as the SSM 5130, but it does not have a robot. The SSM 530 eliminates the need for costly metal and poly deposition processes by using a pneumatically controlled, non-damaging probe design and a top-side mercury contact. It features an extremely stable contact area and uses only a small quantity of mercury to make highly repeatable measurements for process development and process monitoring applications. Typical applications include EPI resistivity, low-k dielectric constant, and oxide integrity. The system can handle wafer diameters from 200 mm to 300 mm and can perform single-site and multiple-site maps. It also features automatic face-up loading to prevent wafer damage, precision pressure regulators for Hg contact, and PROCAP software that provides a full suite of measurements.

he HL5500PC is a high-performance Hall Effect Measurement System designed for measuring resistivity, carrier concentration, and mobility in semiconductors. It is modular in design, allowing for easy upgrades, and is suitable for a wide range of materials, including silicon and compound semiconductors. The system has both low and high resistivity measurement capabilities, with an optional temperature range from below 4K to as high as 600º C. It features an intuitive Microsoft Windows user interface and an optional mapping stage for wafer uniformity measurements. No programming experience is required to set up or use the HL5500PC.

EPI Resistivity Measurement

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Top Products for EPI Resistivity Measurement

VR-70

530

HL5500

ACV 3000