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NEO 2400
Category
Dry / Plasma EtchOverview
The NEO 2400 series production platform is one of the latest additions to the industry leading NEO range of advanced plasma ashing and etching products from Trymax Semiconductor Equipment. The NEO 2400 platform can be configured with any of the available Trymax NEO process modules and is compatible with the substrates up to 200mm in diameter. This platform can be used as a full bridge tool with the compatibility to run substrates of different type and diameter up to 200mm.
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