XACTIX e2
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Dry / Plasma EtchOverview
The Xactix e2 is an ideal solution for those seeking a low cost, table-top R&D xenon difluoride etching system. Key to successful research is process flexibility and the Xactix e2 provides the widest range of process options. Developed as the successor to the e1, the e2 retains ease of use, low cost of ownership and a small footprint, but adds additional options and even greater process flexibility.
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