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CENTURA TRETRA Z
Category
Dry / Plasma EtchOverview
Applied Materials Centura Tetra Z Photomask Etch system delivers state-of-the-art performance required to etch optical lithography photomasks for logic and memory devices at 10nm and beyond. The new system enhances the capabilities of the industry-leading Tetra platform to address advanced resolution enhancement techniques and extend immersion lithography for quadruple patterning with unprecedented CD performance.
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