Description

No description

Configuration

-Platform is specified for ISO5 -Filter wheel with color selection (RGB) -1x, 3x, 5x, 10x , 20x review -Has a OCR reader -Dark field function implemented -It can use the Discovery/True ADC software for offline review -CD measurements are possible, but there is no separate optic available for this -Bare wafers only. Must be modified if sawn wafers are on frame.

OEM Model Description

The F30™ System is an advanced inspection tool designed to blur the lines between dark field micro inspection and traditional macro inspection. It provides automated defect inspection for front-end and outgoing quality (OQA) applications. The system boasts a five-objective turret that enables the resolution-throughput flexibility required by today’s multi-process inspection applications. Equipped with an advanced productivity suite, the F30 System redefines inspection cost of ownership expectations. It has a throughput of up to 120 wph (10µm) and resolution flexibility (10µm to 0.5µm). It also has three simultaneous color defect review methods: on-the-fly, high resolution, whole wafer. The F30 System is suitable for a variety of applications including After develop inspection (ADI), Fab Outgoing QA, Post CMP inspection, and After etch inspection. It can also team with edge and backside modules for an all-surface solution.