
Application	Coating/Developing/
Cleaning/Scrubbing
Wafer size	4" ~ 12"
Substrate	Si, Ceramic, Glass
Features	• Stand-alone spin system
• Optimized tool in R&D
• Easy maintenance and operation
• Faster delivery

SSP 200

MSX-2000	

The SVS MSX-1000 is a piece of equipment used for spin coating photoresist in the semiconductor yellow process. It is known for its precision and accuracy, and has a number of features that make it an excellent choice for many photoresist applications. These features include the ability to handle a variety of photoresists, a motorized 5-axis stage, two high-power light sources, and an intuitive user interface.

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SSP 200

MSX-2000

MSX-1000

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