Description
No descriptionConfiguration
No ConfigurationOEM Model Description
Laboratory Spin Coat and Develop Solution for Wafers up to 150 and 200mm SUSS MicroTec‘s LabSpin platform represents the next generation of manual spin coater and developer systems that have been developed specifically for laboratory and R&D. Designed for a variety of photolithography chemicals, LabSpin systems provide uniform, precise and repeatable spin coating results on the wafer through its advanced process chamber design.Documents
No documents
CATEGORY
Coaters & Developers
Last Verified: 30 days ago
Key Item Details
Condition:
New
Operational Status:
Deinstalled
Product ID:
128427
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SUSS MicroTec / KARL SUSS
LABSPIN6
CATEGORY
Coaters & Developers
Last Verified: 30 days ago
Key Item Details
Condition:
New
Operational Status:
Deinstalled
Product ID:
128427
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
Laboratory Spin Coat and Develop Solution for Wafers up to 150 and 200mm SUSS MicroTec‘s LabSpin platform represents the next generation of manual spin coater and developer systems that have been developed specifically for laboratory and R&D. Designed for a variety of photolithography chemicals, LabSpin systems provide uniform, precise and repeatable spin coating results on the wafer through its advanced process chamber design.Documents
No documents